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An in situ investigation of the surface chemistry during the nucleation and growth of cobalt and nickel using atomic layer deposition (3E012519)

This proposal aims to provide a thorough understanding of the surface chemistry and physics during atomic layer deposition (ALD) of cobalt and nickel for applications in microelectronics and catalysis. In microelectronics, ALD of high quality, continuous

Date:1 Oct 2019  →  Today
Keywords:bimetallic, in vacuo, microelectronics, AFM, catalysis, STM, XRF, Cobalt, in situ, diazadienyl, area selective, FTIR, GISAXS, ALD, Nickel, XPS, plasma