< Back to previous page
Patent
Quality assessment of directed self-assembling method
A method for evaluating the quality of a directed self-assembling method used for generating directed self-assembling patterns. The method for evaluating comprises obtaining at least one set of parameter values for a parameterized set of processing steps and material properties characterizing the directed self-assembling method, thus characterizing a specific directed self-assembling method used for generating a directed self-assembled pattern. The method furthermore comprises obtaining a scattered radiation pattern on the directed self-assembled pattern obtained using the directed self-assembling method characterized by said set of parameter values, thus obtaining scattered radiation pattern results for the directed self-assembled pattern. The method furthermore comprises determining based on the scattered radiation pattern results a qualification score and correlating the qualification score with the set of parameter values.
Patent Publication Number: EP2927747
Year filing: 2015
Year approval: 2016
Year publication: 2015
Status: Requested
URI: link to Espacenet
Technology domains: Optics
Validated for IOF-key: Yes
Attributed to: Associatie KULeuven