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Patent
Combined anneal and selective deposition process
A method for forming a film with an annealing step and a deposition step is disclosed. The method comprises an annealing step for inducing self-assembly or alignment within a polymer. The method also comprises a selective deposition step in order to enable selective deposition on a polymer.
Patent Publication Number: US10741394
Year filing: 2020
Year approval: 2020
Year publication: 2020
Status: Assigned
URI: link to Espacenet
Technology domains: Semiconductors, Optics
Validated for IOF-key: Yes
Attributed to: Associatie KULeuven