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Publication

Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration

Journal Contribution - Journal Article

Journal: Materials Advances

Issue: 8

Volume: 1

Pages: 3049 - 3057

Publication year:2020

Institutional Repository URL: https://lirias.kuleuven.be/3431376
DOI: https://doi.org/10.1039/d0ma00462f
WoS Id: 000625318000043

Accessibility:Open