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Publication

Atomic layer deposition of localised boron- and hydrogen-doped aluminium oxide using trimethyl borate as a dopant precursor

Book Contribution - Book Abstract Conference Contribution

Book: EuroCVD 22 - Baltic ALD 16, Conference abstracts

Number of pages: 1

Publication year:2019

Handle: http://hdl.handle.net/1854/LU-8625845

Accessibility:Closed