Effect of Film Morphology on the Li Ion Intercalation Kinetics in Anodic Porous Manganese Dioxide Thin Films KU Leuven
Electrolytic manganese dioxide (EMD) films are electrodeposited from acid MnSO4 solution, targeting equivalent film thicknesses between 25 and 100 nm onto silicon substrates coated with Pt and TiN seed layers. The structure and morphology of the deposited EMD films are characterized and tied to the observed electrochemical performance. Deposition efficiencies as large as 80% are achieved, as determined from Rutherford back scattering (RBS). TEM ...