Method for performing extreme ultra violet (euv) lithography KU Leuven
A method for performing an extreme ultraviolet (EUV) photo-lithographic processing, the method comprising obtaining a substrate to be patterned having an upper main surface, providing an EUV photoresist layer on the upper main surface, and forming at least one opening in the EUV photoresist layer, wherein the method further comprises, providing, sandwiched between the EUV photoresist layer and the upper main surface, a multi-layer stack having an upper surface and consisting of a first layer of a first material and a second layer of a second material, wherein the materials have a different ...