Benefits of Using a Spatially-Variant Penalty Strength With Anatomical Priors in PET Reconstruction KU Leuven
Corrosion protection of Cu by atomic layer deposition Vrije Universiteit Brussel
Atomic layer deposition (ALD) is a vapor phase technique that is able to deposit uniform, conformal thin films with an excellent thickness control at the atomic scale. 18 nm thick Al2O3 and TiO2 coatings were deposited conformaly and pinhole-free onto micrometer-sized Cu powder, using trimethylaluminum and tetrakis(dimethylamido)titanium(IV), respectively, as a precursor and de-ionized water as a reactant. The capability of the ALD coating to ...