Selective deposition for interdigitated patterns in solar cells

A method (100) for creating an interdigitated pattern for a solar cell is provided, including providing (S110) a substrate with one or more regions covered by a first passivation layer stack covered by a hard mask, and one or more exposed regions. A second passivation layer stack, including at least one layer, is selectively deposited on the exposed regions, including plasma depositing (S120) a sublayer of the at least one layer on the exposed regions and on the hard mask, and plasma etching (S130) the added sublayer with an etch rate that is higher on the hard mask than on the exposed regions, thereby substantially removing the sublayer from the hard mask while leaving a finite thickness of the sublayer on the exposed regions, plasma cleaning (S150) the remaining sublayer, and adding a further sublayer by repeating the steps of deposition (S120) and etching (S130). Cleaning, deposition and etching may be repeated (S142) until a desired thickness of the at least one layer of the second passivation layer stack is obtained.

Octrooi-publicatienummer: EP3624204

Jaar aanvraag: 2020

Jaar toekenning: 2021

Jaar van publicatie: 2020

Status: Aangevraagd

Technologiedomeinen: Semiconductoren

Gevalideerd voor IOF-sleutel: Ja

Toegewezen aan: Associatie KULeuven