Method for verifying a pattern of features printed by a lithography process

The invention is related to a method for verifying a printed pattern comprising polygon-shaped features (1-7) as printed by a lithographic tool using a lithographic mask, wherein a number of sectors of features of the pattern are first defined, and wherein the surface area of these sectors is used for calculating one or more parameters that express the print quality of the features, said parameters being suitable for determining a process window. The surface area of the sectors is determined on a contour of the printed pattern, obtainable from an CD-SEM image of the printed pattern. According to preferred embodiments, the parameters are ratios of surface area-based values divided by reference values. The reference values may be determined on the basis of the design intent of a pattern or on the basis of a contour extracted from a simulated print of the pattern.

Octrooi-publicatienummer: EP3133553

Jaar aanvraag: 2021

Jaar toekenning: 2021

Jaar van publicatie: 2021

Status: Toegewezen

Technologiedomeinen: Computertechnologie, Optica

Gevalideerd voor IOF-sleutel: Ja

Toegewezen aan: Associatie KULeuven