Onderzoeker
Qi Xie
- Disciplines:Fysica van gecondenseerde materie en nanofysica
Affiliaties
- Vakgroep Vastestofwetenschappen (Departement)
Lid
Vanaf1 aug 2009 → 31 jul 2011
Publicaties
1 - 10 van 24
- Semiconductor-metal transition in thin VO2 films deposited by ozone based atomic layer deposition(2012)
Auteurs: Geert Rampelberg, Marc Schaekers, Koen Martens, Qi Xie, Davy Deduytsche, Bob De Schutter, Nicolas Blasco, Jorge Kittl, Christophe Detavernier
Aantal pagina's: 1 - Fermi level depinning failure for Al/GeOU+2082/Ge contacts(2012)
Auteurs: Hao Yu, Qi Xie, Yu-Long Jiang, Davy Deduytsche, Christophe Detavernier
Pagina's: P79 - P81 - Improved thermal stability and electrical performance by using PEALD ultrathin Al2O3 film with Ta as Cu diffusion barrier on low k dielectrics(2012)
Auteurs: Shao-Feng Ding, Qi Xie, Fei Chen, Hai-Sheng Lu, Shaoren Deng, Davy Deduytsche, Christophe Detavernier, Xin-Ping Qu
Pagina's: P54 - P56 - TaN/Ta as an effective diffusion barrier for direct contact of copper and NiSi(2012)
Auteurs: Yu-Long Jiang, Qi Xie, Xin-Ping Qu, David W Zhang, Davy Deduytsche, Christophe Detavernier
Pagina's: H9 - H13 - Band alignment in Ge/GeOx/HfO₂/TiO₂ heterojunctions as measured by hard X-ray photoelectron spectroscopy(2012)
Auteurs: AK Rumaiz, JC Woicik, C Weiland, Qi Xie, DP Siddons, GH Jaffari, Christophe Detavernier
- Germanium surface passivation and atomic layer deposition of high-k dielectrics: a tutorial review on Ge-based MOS capacitors(2012)
Auteurs: Qi Xie, Shaoren Deng, Marc Schaekers, Dennis Lin, Matty Caymax, Annelies Delabie, Xin-Ping Qu, Yu-Long Jiang, Davy Deduytsche, Christophe Detavernier
- Investigation of ultra-thin Al₂O₃ film as Cu diffusion barrier on low-k (k=2.5) dielectrics(2011)
Auteurs: Shao-Feng Ding, Qi Xie, Fei Chen, Hai-Sheng Lu, Shao-Ren Deng, Christophe Detavernier, Guo-Ping Ru, Yu-Long Jiang, Xin-Ping Qu
Aantal pagina's: 1 - TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer(2011)
Auteurs: Qi Xie, Jan Musschoot, Marc Schaekers, Matty Caymax, Annelies Delabie, Dennis Lin, Xin-Ping Qu, Yu-Long Jiang, Sven Van den Berghe, Christophe Detavernier
Pagina's: G27 - G30 - High-performance Ge MOS capacitors by O₂ plasma passivation and O₂ ambient annealing(2011)
Auteurs: Qi Xie, ShaoRen Deng, Marc Schaekers, Dennis Lin, Matty Caymax, Annelies Delabie, YuLong Jiang, XinPing Qu, Davy Deduytsche, Christophe Detavernier
Pagina's: 1656 - 1658 - ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems(2011)
Auteurs: Thomas Waechtler, Shao-Feng Ding, Lutz Hofmann, Robert Mothes, Qi Xie, Steffen Oswald, Christophe Detavernier, Stefan E Schulz, Xin-Ping Qu, Heinrich Lang, et al.
Pagina's: 684 - 689