Onderzoeker
Ming Wu
- Disciplines:Productieprocessen, -methoden en -technologieën
Affiliaties
- Maakprocessen en -Systemen (MaPS) (Afdeling)
Lid
Vanaf1 mrt 2021 → Heden
Publicaties
1 - 10 van 14
- Position-dependent milling process monitoring and surface roughness prediction for complex thin-walled blade component(2023)
Auteurs: Zequan Yao, Ming Wu
- An Unsupervised Learning Method for Pulse Classification in EDM(2023)
Auteurs: Ming Wu, Jun Qian, Long Ye, Dominiek Reynaerts
Pagina's: 149 - 152Aantal pagina's: 4 - Experimental and Numerical Investigations on Fabrication of Surface Microstructures Using Mask Electrolyte Jet Machining and Duckbill Nozzle(2023)
Auteurs: Ming Wu, Muhammad Hazak Arshad, Krishna Kumar Saxena, Dominiek Reynaerts
- Multi-Ion-Based Modelling and Experimental Investigations on Consistent and High-Throughput Generation of a Micro Cavity Array by Mask Electrolyte Jet Machining(2022)
Auteurs: Ming Wu, Jun Qian, Dominiek Reynaerts
- Analysis of passivation during ECM and hybrid laser-ECM through automated current pulse analysis(2022)
Auteurs: Muhammad Hazak Arshad, Ming Wu, Krishna Kumar Saxena, Dominiek Reynaerts
Pagina's: 123 - 130 - A ‘virtual sensing’ framework for µECM/hybrid laser- µECM for monitoring interelectrode gap conditions(2022)
Auteurs: Krishna Kumar Saxena, Muhammad Hazak Arshad, Ming Wu, Jun Qian, Dominiek Reynaerts
Pagina's: 445 - 452 - Experimental Investigations into Machining Characteristics of Niobium Carbide Cermet with µECM / hybrid laser-µECM(2022)
Auteurs: Muhammad Hazak Arshad, Ming Wu, Krishna Kumar Saxena, Jun Qian, Shuigen Huang, Dominiek Reynaerts
Pagina's: 385 - 391 - Profile prediction in ECM using machine learning(2022)
Auteurs: Ming Wu, Muhammad Hazak Arshad, Krishna Kumar Saxena, Jun Qian, Dominiek Reynaerts
Pagina's: 410 - 416 - Prediction of milling-μEDM tool wear: the benefit of process monitoring and machine learning model(2022)
Auteurs: Long Ye, Ming Wu, Krishna Kumar Saxena, Jun Qian, Dominiek Reynaerts
Pagina's: 263 - 266 - Data-driven framework of ECM: A machine learning model for profile prediction(2021)
Auteurs: Ming Wu, Muhammad Hazak Arshad, Krishna Kumar Saxena, Jun Qian, Dominiek Reynaerts
Pagina's: 231 - 240