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Onderzoeker
Cultureman Vaglio Pret
- Disciplines:Nanotechnologie, Ontwerptheorieën en -methoden
Affiliaties
- Geassocieerde Afdeling ESAT - INSYS (INSYS), Integrated Systems (Afdeling)
Lid
Vanaf1 aug 2020 → 30 sep 2012 - Geassocieerde Afdeling ESAT - INSYS, Integrated Systems (Afdeling)
Lid
Vanaf1 okt 2008 → 30 sep 2012
Publicaties
1 - 10 van 23
- XAS photoresists electron/quantum yields study with synchrotron light(2015)
Auteurs: Peter De Schepper, Cultureman Vaglio Pret
- Hydrogen plasma treatment: The evolution of roughness in frequency domain(2014)
Auteurs: Peter De Schepper, Cultureman Vaglio Pret, Ziad El Otell, Stefan De Gendt
Pagina's: 1 - 1 - Line edge and width roughness smoothing by plasma treatment(2014)
Auteurs: Peter De Schepper, Cultureman Vaglio Pret, Ziad El Otell, Stefan De Gendt
- Mask effects on resist variability in extreme ultraviolet lithography(2013)
Auteurs: Cultureman Vaglio Pret, Jan Engelen
Pagina's: 03 - 03 - Line edge and width roughness smoothing by plasma treatment(2013)
Auteurs: Peter De Schepper, Cultureman Vaglio Pret, Stefan De Gendt
Pagina's: 868505 - Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher(2013)
Auteurs: Cultureman Vaglio Pret
Pagina's: 23003 - 23003 - Evidence of speckle in extreme-UV lithography(2012)
Auteurs: Cultureman Vaglio Pret, Jan Engelen
Pagina's: 25970 - 25978 - Mask roughness impact on extreme UV and 193 nm immersion lithography(2012)
Auteurs: Cultureman Vaglio Pret
Pagina's: 138 - 141 - Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories(2012)
Auteurs: Pavel Poliakov, Cultureman Vaglio Pret, Jan Van Houdt, Wim Dehaene
Pagina's: 525 - 529 - Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer(2012)
Auteurs: Cultureman Vaglio Pret
Pagina's: 832207