Surface-dependent adsorption and diffusion processes in area-selective deposition of ruthenium KU Leuven
Vapour-phase chemical deposition techniques rely on an interplay of adsorption, diffusion, reaction, and desorption processes, all of which can be surface-dependent. Area-selective deposition (ASD) exploits this surface dependence to deposit material selectively on a target area. Ruthenium receives increasing interest for several applications, including conductors for nanoelectronic interconnects, etch-resistant hardmasks, and heterogeneous ...