Cr and CrOx etching using SF6 and O2 plasma Vrije Universiteit Brussel
Chromium is a frequently encountered material in modern nanofabrication, directly as a functional material (e.g., photomask generation) or indirectly as a hard mask (e.g., to etch quartz). With the continuous downscaling of devices, the control of the feature size of patterned Cr and CrOx becomes increasingly important. Cr and CrOx etching is typically performed using chlorine-oxygen-based plasma chemistries, but the nanoscale imposes ...