Publications
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Mangrove forests submitted to depositional processes and salinity variation, using satellite images and vegetation structure surveys Vrije Universiteit Brussel
Growth dynamics of nanocrystalline diamond thin films deposited by hot filament chemical vapor deposition: Influence of low sticking and renucleation processes KU Leuven
Nanocrystalline diamond (NCD) thin films are being progressively more employed in different applications. However, the current understanding of their growth mechanisms, which becomes important to properly tune their properties, is still very limited. In this context, we have studied by atomic force microscopy the growth dynamics of NCD thin films grown on micro- and nanoseeded silicon substrates by hot filament chemical vapor deposition for ...
Surface-dependent adsorption and diffusion processes in area-selective deposition of ruthenium KU Leuven
Vapour-phase chemical deposition techniques rely on an interplay of adsorption, diffusion, reaction, and desorption processes, all of which can be surface-dependent. Area-selective deposition (ASD) exploits this surface dependence to deposit material selectively on a target area. Ruthenium receives increasing interest for several applications, including conductors for nanoelectronic interconnects, etch-resistant hardmasks, and heterogeneous ...
Chemical vapor deposition processes for the fabrication of epitaxial Si-O superlattices KU Leuven
Band engineered Si/O superlattices are promising channel materials for ultimately scaled complementary metal oxide semiconductor devices. Theoretical calculations have indicated that insertion of O monolayers into Si lattice creates anisotropy in the Si band structure with an enhanced carrier mobility in the channel direction. However, the experimental demonstration of such superlattices is not straightforward, as it requires processes for the ...
Metal-organic frameworks by vapor deposition processes KU Leuven
Nanotechnology has become a backbone of materials science innovation. The transition towards processing at such dimensions has led to high-performance materials development to meet growingly demanding commercial specifications. Metal-organic frameworks (MOFs), a subclass of porous solids comprised of metal-containing nodes connected by polytopic organic linkers, are gaining attention in the materials science arena. With many interesting ...
Simultaneous etching and deposition processes during the etching of silicon with a $Cl_{2}/O_{2}/Ar$ inductively coupled plasma University of Antwerp
In this article, surface processes occurring during the etching of Si with a Cl2/O2/Ar plasma are investigated by means of experiments and modeling. Cl2-based plasmas are commonly used to etch silicon, while a small fraction of O2 is added to protect the sidewalls from lateral etching during the shallow trench isolation process. When the oxygen fraction exceeds a critical value, the wafer surface process changes from an etching regime to a ...
Hydrogenated amorphous carbon films deposited using plasma enhanced chemical vapor deposition processes Interuniversity Microelectronics Centre
Hydrogenated amorphous carbon (a-C:H) is a class of amorphous carbon with more than 30% hydrogen content and containing sp(2) as well as sp(3) carbon atoms. It is widely used as a hard mask in semiconductor device fabrication, protective coatings, lubricants, and biomedical applications. The properties of a-C:H films are known to be strongly dependent on the carbon bonding structure and are characterized using the sp(2)/sp(3) carbon ...
Investigation of etching and deposition processes of $Cl_{2}/O_{2}/Ar$ inductively coupled plasmas on silicon by means of plasmasurface simulations and experiments University of Antwerp
In this paper, a simulation method is described to predict the etching behaviour of Cl2/O2/Ar inductively coupled plasmas on a Si substrate, as used in shallow trench isolation for the production of electronic devices. The hybrid plasma equipment model (HPEM) developed by Kushner et al is applied to calculate the plasma characteristics in the reactor chamber and two additional Monte Carlo simulations are performed to predict the fluxes, angles ...