Interface study of ferroelectric/oxide semiconductor stacks and devices KU Leuven
This PhD project will investigate how the structure of the HZO/IGZO interface affects the FEFET characteristics so that I can tune and improve the performance. I will investigate how the structure of the HZO/OSC(Oxide Semiconductor Channels) interface affects FEFET characteristics by first assessing physical and chemical characteristics of metal/HZO/OSC/metal stacks, and next studying the derived transistors. I will study the impact of OSC ...