Via formation in an integrated circuit. Interuniversity Microelectronics Centre
Method for forming an integrated circuit comprising the steps of: a. Providing a semiconductor structure comprising: i. two transistors, ii. a gate on the channel of the transistor, iii. contacts coupled to each transistor, iv. a dielectric layer over the two transistors, the gate, and the contacts, v. a first conductive line arranged within a first metallization level and extending along a first direction, vi. a first conductive via connecting the first conductive line with a first contact of a transistor, vii. a second conductive via connecting the first conductive line with a second ...