Computer modelling and experimental validation of plasmas and plasma- surface interactions, for a deep insight in cryogenic etching (Cryoetch). University of Antwerp
Microchips have caused a revolution in electronics over the last few decades. Following Moore's law, much effort has been put into continuously shrinking electronic feature dimensions. Indeed, typical feature sizes of semi-conductors decreased from 10 μm in 1971 to 14 nm in 2014. With the shrinkage of feature sizes, plasma etching plays a more and more important role due to its anisotropy during surface processing. However, to go beyond 14 nm ...