Atomic assessment of paramagnetic defects in 2-dimensional semiconductor layers: MoS2 KU Leuven
For decades, the semiconductor industry has pursued the extensive miniaturization of the transistor. Conventional Si-based devices are however reaching their scaling limits since undesired 'physics' effects arise when Si-based transistors are ultra-scaled. A possible solution to overcome these electrostatic control issues and lithography challenges is to incorporate novel 2D materials in future nanoelectronic devices. In this regard, TMDs, and ...