Joint focused ion beam (FIB) facility for nanofabrication and nanocharacterization KU Leuven
The dual beam FIB (focused ion beam) system allows the controlled restructuring, removal or deposition of material with a lateral resolution of just a few nanometer. By bombarding a sample with a low-energy, focused ion beam, one can create nanostructure with a specific size and shape, modify their structure, or electrically isolate them from their vicinity. Hence, the properties can be tuned at nanometer scale. Moreover, this process allows ...