Alternative Photoresist for Advanced Extreme ultraviolet lithography (EUVL) KU Leuven
Sustainable Chemistry for Metals and Molecules, Membrane Separations, Adsorption, Catalysis, and Spectroscopy for Sustainable Solutions (cMACS)
This PhD project aims to develop an alternative photoresist based on organometallics chemistry for Extreme Ultraviolet (EUV) lithography. Moore’s Law predicted that number of transistors per IC will be doubled every year. And to accommodate this increase the key is the dimension (size and density) of the pattern transferred to the wafer by lithography. e. The extreme ultra-violet (EUV) lithography, at a wavelength of 13.5 nm is the ...