Plasma chemistry modeling in a capacitively coupled plasma used for microelectronics applications. University of Antwerp
Plasmas are widely used in the microelectronics industry for the fabrication of computer chips, i.e., in plasma etching and deposition of different materials. Nowadays there is increased interest for the use of very complex gas mixtures, such as based on CHxFy, sometimes even in combination with HBr, Cl2 and O2. In this project, we wish to obtain a better understanding of the plasma chemistry in several CHxFy plasmas, i.e., CHF3, CH2F2 , CH3F ...