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Researcher
Annelies Delabie
- Disciplines:Physical chemistry, Theoretical and computational chemistry, Other chemical sciences, Biochemistry and metabolism, Medical biochemistry and metabolism, Atmospheric sciences
Affiliations
- Quantum Chemistry and Physical Chemistry (Division)
Member
From1 Oct 2012 → Today
Projects
1 - 10 of 19
- Ferroelectric memories: multi-layers stacks with tailored physical and electric properties by atomic layer depositionFrom20 Oct 2023 → TodayFunding: Own budget, for example: patrimony, inscription fees, gifts
- Atomic-scale bottom-up fabrication: Area-Selective Deposition (ASD) of Si-based dielectrics and its application in IC manufacturingFrom15 Oct 2023 → TodayFunding: Own budget, for example: patrimony, inscription fees, gifts
- Interface study of ferroelectric/oxide semiconductor stacks and devicesFrom20 Sep 2023 → TodayFunding: Own budget, for example: patrimony, inscription fees, gifts
- Area-selective deposition mechanisms when pattern dimensions reach the nanoscaleFrom11 Sep 2023 → TodayFunding: Own budget, for example: patrimony, inscription fees, gifts
- Atomic layer deposition of two-dimensional transition metal dichalcogenides and ovonic threshold switching materials: A new computational framework for precursor designFrom1 Oct 2022 → TodayFunding: FWO Strategic Basic Research Grant
- Alternative semiconducting oxides for future DRAM applicationsFrom25 May 2022 → TodayFunding: Own budget, for example: patrimony, inscription fees, gifts
- Creating dielectric layers on two-dimensional (2D) semiconductors: chemical and physical mechanismsFrom18 Jan 2022 → TodayFunding: Own budget, for example: patrimony, inscription fees, gifts
- Mechanisms and Selectivity during Atomic Layer Deposition of Germanium Chalcogenides for Storage Class Memory ApplicationsFrom1 Oct 2021 → TodayFunding: Own budget, for example: patrimony, inscription fees, gifts
- Dielectric Nanosheets for Scaled Two-Dimensional (2D) Material DevicesFrom22 Jan 2021 → TodayFunding: Own budget, for example: patrimony, inscription fees, gifts
- Towards graphoepitaxy of semiconducting 2D single crystals on dielectric substrate patterns for next generation nanoelectronic devicesFrom5 Jan 2021 → TodayFunding: FWO Strategic Basic Research Grant
Publications
151 - 160 of 180
- Deposition processes for the fabrication of epitaxial Si-O superlattices
Authors: Annelies Delabie, Johan Meersschaut, Wilfried Vandervorst, Marc Heyns
Pages: 33 - 34 - Ultrathin GeOxNy interlayer formed by in situ NH3 plasma pretreatment for passivation of germanium metal-oxide-semiconductor devices
Authors: Annelies Delabie
- The impact of stacked cap layers on effective work function with HfSiON and SiON gate dielectrics
Authors: Annelies Delabie
Pages: 743 - 745 - Development of ALD HfZrOx with TDEAH/TDEAZ and H2O
Authors: Annelies Delabie
Pages: H69 - H74 - Band offsets at interfaces of (100)InxGa1-xAs(0≤x≤0.53) with Al2O3 and HfO2
Authors: Valeri Afanasiev, Andre Stesmans, G Brammertz, Annelies Delabie, S Sionke, A O'Mahony, IM Povey, ME Pemble, E O'Connor, PK Hurley, et al.
Pages: 1550 - 1553 - III-V/oxide interfaces investigated with synchrotron radiation photoemission spectroscopy
Authors: Annelies Delabie
Pages: 123 - 128 - Strain enhanced low-V-T CMOS featuring La/Al-doped HfSiO/TaC and 10ps invertor delay
Authors: Laura Nyns, Annelies Delabie, Kristin De Meyer
Pages: 130 - 131 - TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer
Authors: Annelies Delabie, Han Chung Lin
Pages: G27 - G30 - Deposition of O atomic layers on Si(100) substrates for epitaxial Si-O superlattices: investigation of the surface chemistry
Authors: Suseendran Jayachandran, Annelies Delabie, Arne Billen, Harold Dekkers, Bastien Douhard, Thierry Conard, Johan Meersschaut, Matty Caymax, Wilfried Vandervorst, Marc Heyns
Pages: 251 - 257 - Novel process to pattern selectively dual dielectric capping layers using soft-mask only
Authors: Annelies Delabie, Kristin De Meyer
Pages: 44 - 45
Patents
1 - 10 of 10
- Method of manufacturing a semiconductor structure (Inventor)
- Method of manufacturing a semiconductor structure (Inventor)
- A method for forming a vertical hetero-stack and a device including a vertical hetero-stack (Inventor)
- A method for forming a silicide gate for a semiconductor device (Inventor)
- Method of producing transition metal dichalcogenide layer (Inventor)
- Method for forming a vertical hetero-stack and a device including a vertical hetero-stack (Inventor)
- Method of forming a feature of a target material on a substrate (Inventor)
- METHOD OF PRODUCING TRANSITION METAL DICHALCOGENIDE LAYER (Inventor)
- Method for selectively depositing noble metals on metal/metal nitride substrates (Inventor)
- Oxygen monolayer on a semiconductor (Inventor)