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Publication

Engineering high quality and conformal ultrathin SiNx films by PEALD for downscaled and advanced CMOS nodes

Journal Contribution - Journal Article

Journal: Journal of Vacuum Science and Technology A
ISSN: 0734-2101
Issue: 4
Volume: 39
Accessibility:Open

Authors/publisher

  • Antony Premkumar Peter (First author)
  • Takayama Tomomi (Author)
  • Ebisudani Taishi (Author)
  • Shiba Eiichiro (Author)
  • Alfonso Sepulveda (Author)
  • Timothee Blanquart (Author)
  • Yosuke Kimura (Author)
  • Sujith Subramanian (Author)
  • Sylvain Baudot (Author)
  • Briggs Basoene (Author)
  • Anshul Gupta (Author)
  • Anabela Veloso (Author)
  • Elena Capogreco (Author)
  • Hans Mertens (Author)
  • Johannes Meersschaut (Author)
  • Thierry Conard (Author)
  • Praveen Dara (Author)
  • Jef Geypen (Author)
  • Gerardo Martinez (Author)
  • Dmitry Batuk (Author)
  • Steven Demuynck (Author)
  • Pierre Morin (Last author)

Research units