< Back to previous pagePublication Building patterns from the bottom: a complementary approach to lithography Journal Contribution - Journal ArticleJournal: Semiconductor DigestISSN: 2643-7058Volume: 2Pages: 14 - 19Institutional Repository URL: https://lirias.kuleuven.be/3362728 Accessibility:OpenAuthors/publisherHyo Seon Suh (First author)Annelies Delabie (Author)Silvia Armini (Last author)Research unitsQuantum Chemistry and Physical Chemistry(Division)KU Leuven