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Project
In situ XRF and XAS study of Atomic Layer Deposition on flat and porous sustrates - deposition of bimetallic materials.
The research involves the development of synchrotron based measuring techniques for the in situ characterisation of an atomic deposition process of inorganic materials in/onto solids. As specific application the deposition and formation of bimetallic materilas are studied.
Date:1 Jan 2011 → 31 Dec 2014
Keywords:thin film growth, XAS, bimetallic materials, Atomic Layer Deposition (ALD), XRF
Disciplines:Condensed matter physics and nanophysics