Fundamental study of the growth kinetics and conformality of thermal and plasma-enhanced atomic layer deposition

Growth kinetics of ALD and PE-ALD: this work studies fundamental questions about initial nucleation, the evolution of the surface roughness and crystallinity of the films during deposition. Conformality of ALD and PE-ALD: this study aims to characterize the conformality as a function of aspect ratio, temperature and pulse times. A second goal is to model the conformality.