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Project

Development of an in-situ flux energy flux analysator and flux monitor, to study the growth of thin films deposited by physical vapor deposition

Two techniques will be developed to measure all fluxes towards the substrate during deposition. They should allow to model the energy flux, momentum flux and material flux towards the substrate as a function of the used deposition conditions. Comparing the properties of thin films deposited at similar conditions, should allow the user to investigate the fundamental aspects of thin film growth.

Date:1 Jan 2008 →  31 Dec 2010
Keywords:magnetron sputtering, energy flux, thin film growth
Disciplines:Physics of gases, plasmas and electric discharges not elsewhere classified, Materials science and engineering, Physics of gases, plasmas and electric discharges, Condensed matter physics and nanophysics