Quality assessment of directed self-assembling method

A method for evaluating the quality of a directed self-assembling method used for generating directed self-assembling patterns. The method for evaluating comprises obtaining at least one set of parameter values for a parameterized set of processing steps and material properties characterizing the directed self-assembling method, thus characterizing a specific directed self-assembling method used for generating a directed self-assembled pattern. The method furthermore comprises obtaining a scattered radiation pattern on the directed self-assembled pattern obtained using the directed self-assembling method characterized by the set of parameter values, thus obtaining scattered radiation pattern results for the directed self-assembled pattern. The method furthermore comprises determining based on the scattered radiation pattern results a qualification score and correlating the qualification score with the set of parameter values.

Patent Publication Number: US10048212

Year filing: 2018

Year approval: 2018

Year publication: 2018

Status: Assigned

Technology domains: Computer technology, Optics, Measurement, Engines, pumps, turbines

Validated for IOF-key: Yes

Attributed to: Associatie KULeuven