< Back to previous page

Project

Advanced infrastructure for fabrication of next-generation micro- and nanosystems

This application aims to strongly improve the infrastructure that underpins the cutting-edge research of KU Leuven inmicro- and nanosystems, and to guarantee its continued operation. To achieve this, a state-of-the art
photolithography cluster (spin-coater and maskless aligner) will be acquired together with an aligner-wafer bonding platform. Our R&D cleanroom in the Leuven NanoCentre contains traditional photolithography tools that are
intensively used by a dozen of research groups across the Physics, Chemistry, Microbial and Molecular Systems (M2S), Biosystems, and Electrical Engineering Departments.
However, the current lithography equipment is nearing theend of its technological and physical life. The gap between the state-of-the-art and vacant equipment at the Leuven NanoCentre is becoming too large to remain competitive.
Investing in the latest-generation equipment for spin coating, fast, flexible, and high-resolution maskless lithography and advanced bonding will vastly improve specifications and performance of micro- and nanosystems,
therefore opening a plethora of new capabilities and possibilities for biochemical, biomedical and physical sensors and devices, 3D integrated devices, III/V materials, advanced microfluidics, lab-on-chips, medical implants.Furthermore, this advanced infrastructure opens up new possibilities for collaboration not only among consortium members but also attracting new users to the cleanroom including industrial partners.

Date:1 May 2022 →  Today
Keywords:lithography equipment, spin coater, maskless aligner, wafer bonder
Disciplines:Micro- and nanoelectromechanical systems