A MEASUREMENT CONFIGURATION BASED ON LINEAR SCALES ABLE TO MEASURE TO A TARGET ALSO MOVING PERPENDICULAR TO THE MEASUREMENT AXIS

Laser interferometers and high-quality linear encoders both are competitive linear measurement systems used in high-precision machines. Plane laser interferometry allows measuring to a target that moves perpendicular to the measurement direction and to set up the laser beam in line with the functional point. In this way, a stacking of measurement systems can be avoided and a measurement configuration complying with the Abbe principle can be configured. On the other hand, laser interferometry is known to be sensitive to environmental changes. High-quality linear scales are used as an alternative. A disadvantage of linear scales is that the target is only allowed to move along the measurement axis. For targets translating in more than one direction with a range over several millimetres, this leads to a simple stacking of several linear scales together with the supporting slides. This indirect way of measuring introduces errors and partially destroys the accuracy provided by modern linear scales. This patent describes a measurement concept based on linear scales, which combines the stability to environmental changes, typical for linear scales, with the ability to measure to a target that moves also in a direction perpendicular to the measurement axis, typical for plane mirror laser interferometry. The measurement concept is especially interesting for multi-axis machines where a stable and homogeneous atmosphere cannot be guarantied and where measurements should be done during motion.

Patent Publication Number: EP1749247

Year filing: 2005

Year approval: 2014

Year publication: 2014

Status: Assigned

Technology domains: Optics, Measurement, Control

Validated for IOF-key: Yes

Attributed to: Associatie KULeuven