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Publication

Atomic-scale investigations on the wet etching kinetics of Ge versus SiGe in acidic H2O2 solutions: a post operando synchrotron XPS analysis

Journal Contribution - Journal Article

Journal: Journal of Materials Chemistry C
ISSN: 2050-7526
Issue: 29
Volume: 8
Pages: 10060 - 10070
Publication year:2020
BOF-keylabel:yes
IOF-keylabel:yes
BOF-publication weight:3
CSS-citation score:1
Authors:International
Authors from:Government, Higher Education
Accessibility:Closed