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Publication
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Journal Contribution - Journal Article
Journal: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
ISSN: 2166-2746
Issue: 6
Volume: 37
Publication year:2019
BOF-keylabel:yes
IOF-keylabel:yes
BOF-publication weight:1
CSS-citation score:1
Authors from:Government, Higher Education
Accessibility:Closed