A vapor dosing platform for deposition of porous crystalline solids

Metal-organic frameworks (MOFs) are a class of crystalline solids that consist of inorganic nodes connected by multitopic organic molecules. Perfectly uniform pores, with a diameter typically in the nanometer-range and walls of only a single molecule thick, form through self-assembly of the MOF crystal lattice and give rise to a record internal surface area. Because of the possibility to create a tailored nano-environment inside the MOF pores, there is tremendous potential for integrating these materials into microelectronics, e.g. as active sensor coatings, solid electrolytes, tunable conductors, etc. A key step in integrating MOFs in microelectronics will be the development of robust thin film deposition methods. Thus far, the procedures for the deposition of MOF films are incompatible with microelectronics fabrication since contacting circuitry with a MOF synthesis solution leads to corrosion and contamination. However, very recently, we succeeded in the proof-of-concept demonstration of MOF-CVD: growing MOF films through chemical vapor deposition, a cornerstone manufacturing technique in the microelectronics industry. This project aims to expand the proof-of- concept MOF-CVD case into a platform that bridges the worlds of nanoscale chemistry and microelectronics manufacturing.