Researcher
Jakob Kuhs
- Disciplines:Condensed matter physics and nanophysics
Affiliations
- Research Co-ordination Office (Administrative office)
Member
From1 Oct 2020 → Today - Department of Solid State Sciences (Department)
Member
From28 May 2014 → 20 Sep 2020
Publications
1 - 10 of 11
- Atomic layer deposition of metal sulphides for the embedding of colloidal quantum dots(2020)
Authors: Jakob Kuhs
- In situ characterization of quantum dot photoluminescence during atomic layer deposition: towards stable Cd-free QD-based devices(2020)
Authors: Robin Petit, Natalia Zawacka, Jakob Kuhs, Philippe Smet, Zeger Hens, Christophe Detavernier
Number of pages: 1 - Ligand binding to copper nanocrystals : amines and carboxylic acids and the role of surface oxides(2019)
Authors: Arnau Oliva Puigdomènech, Jonathan De Roo, Jakob Kuhs, Christophe Detavernier, José Martins, Zeger Hens
Pages: 2058 - 2067 - In situ photoluminescence of colloidal quantum dots during gas exposure : the role of water and reactive atomic layer deposition precursors(2019)
Authors: Jakob Kuhs, Andreas Werbrouck, Natalia Zawacka, Emile Drijvers, Philippe Smet, Zeger Hens, Christophe Detavernier
Pages: 26277 - 26287 - Impact of atomic layer deposition on the photoluminescence of colloidal quantum dots(2019)Volume: MA2019-02
Authors: Jakob Kuhs, Andreas Werbrouck, Natalia Zawacka, Emile Drijvers, Philippe Smet, Zeger Hens, Christophe Detavernier
Number of pages: 1 - Plasma enhanced atomic layer deposition of gallium sulfide thin films(2019)
Authors: Jakob Kuhs, Zeger Hens, Christophe Detavernier
- Plasma enhanced atomic layer deposition of aluminum sulfide thin films(2018)
Authors: Jakob Kuhs, Zeger Hens, Christophe Detavernier
- Plasma enhanced atomic layer deposition of aluminium sulphide(2017)
Authors: Jakob Kuhs, Zeger Hens, Christophe Detavernier
Number of pages: 1 - Plasma enhanced atomic layer deposition of zinc sulfide thin films(2017)
Authors: Jakob Kuhs, Thomas Dobbelaere, Zeger Hens, Christophe Detavernier
- Thin, low roughness Ru films deposited by thermal and plasma enhanced atomic layer deposition using RuO4 and H2 at low temperatures(2016)
Authors: Matthias Minjauw, Jolien Dendooven, Christian Dussarat, Eduardo Solano Minuesa, Kilian Devloo-Casier, Jakob Kuhs, Marc Schaekers, Alessandro Coati, Christophe Detavernier
Number of pages: 1