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Researcher
Cultureman Vaglio Pret
- Disciplines:Nanotechnology, Design theories and methods
Affiliations
- Assiocated Division ESAT-INSYS (INSYS), Integrated Systems (Division)
Member
From1 Aug 2020 → 30 Sep 2012 - Associated Section of ESAT - INSYS, Integrated Systems (Division)
Member
From1 Oct 2008 → 30 Sep 2012
Publications
1 - 10 of 23
- XAS photoresists electron/quantum yields study with synchrotron light(2015)
Authors: Peter De Schepper, Cultureman Vaglio Pret
- Hydrogen plasma treatment: The evolution of roughness in frequency domain(2014)
Authors: Peter De Schepper, Cultureman Vaglio Pret, Ziad El Otell, Stefan De Gendt
Pages: 1 - 1 - Line edge and width roughness smoothing by plasma treatment(2014)
Authors: Peter De Schepper, Cultureman Vaglio Pret, Ziad El Otell, Stefan De Gendt
- Mask effects on resist variability in extreme ultraviolet lithography(2013)
Authors: Cultureman Vaglio Pret, Jan Engelen
Pages: 03 - 03 - Line edge and width roughness smoothing by plasma treatment(2013)
Authors: Peter De Schepper, Cultureman Vaglio Pret, Stefan De Gendt
Pages: 868505 - Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher(2013)
Authors: Cultureman Vaglio Pret
Pages: 23003 - 23003 - Evidence of speckle in extreme-UV lithography(2012)
Authors: Cultureman Vaglio Pret, Jan Engelen
Pages: 25970 - 25978 - Mask roughness impact on extreme UV and 193 nm immersion lithography(2012)
Authors: Cultureman Vaglio Pret
Pages: 138 - 141 - Trades-off between lithography line edge roughness and error-correcting codes requirements for NAND Flash memories(2012)
Authors: Pavel Poliakov, Cultureman Vaglio Pret, Jan Van Houdt, Wim Dehaene
Pages: 525 - 529 - Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer(2012)
Authors: Cultureman Vaglio Pret
Pages: 832207